About
AVOLTON Inc. develops and manufactures laboratory vacuum deposition systems for thin film research and industrial applications. The company is based in Ottawa, Canada and has over 20 years of experience in development of vacuum coating equipment. Our focus is reliable engineering solutions, robust design and practical serviceability. We manufacture our own magnetrons used in our systems and can also integrate magnetrons from other manufacturers based on customer requirements. We specialize in magnetron sputtering and resistive evaporation systems for universities, research labs and advanced materials development.
Products
Laboratory Magnetron Sputtering SystemLaboratory vacuum magnetron sputtering system designed for thin film research and development. The system can be configured with 2 or 3 magnetrons and optional ion source for substrate cleaning and film quality improvement. Power supplies may include DC, pulsed DC or RF generator with automatic matching network. The chamber is water-cooled for stable thermal operation and process repeatability. System may include turbomolecular pump for oil-free high vacuum and rotary vane or dry scroll backing pump. Three-position gate valve allows reduction of process gas consumption. System may be equipped with 2 mass flow controllers, optional 3 or 4, for process gas control. Integrated thickness monitor provides precise deposition rate and thickness control. Substrate heating up to 200 °C. Internal shields protect chamber walls and simplify maintenance. Vacuum measurement is performed using hot cathode high vacuum gauge; optional capacitance manometer can be supplied for customers requiring high-precision vacuum measurement. Manual control concept provides flexibility for research work and allows cost-effective system configuration. |
Laboratory Resistive Evaporation SystemLaboratory vacuum resistive evaporation system designed for thin film deposition and materials research. The system may be configured with one or two evaporation sources for sequential or co-deposition processes. Power supplies are designed for stable control of evaporation sources and repeatable deposition conditions. The chamber is water-cooled for stable thermal operation and process repeatability. System may include turbomolecular pump for oil-free high vacuum and rotary vane or dry scroll backing pump. Standard gate valve is used between chamber and turbomolecular pump. System can be supplied without mass flow controllers or optionally equipped with up to 3 mass flow controllers for process gas control. Integrated thickness monitor provides precise deposition rate and thickness control. Substrate heating up to 200 °C. Internal shields protect chamber walls and simplify maintenance. Vacuum measurement is performed using hot cathode high vacuum gauge; optional capacitance manometer can be supplied for customers requiring high-precision vacuum measurement. Manual control concept provides flexibility for research work and allows cost-effective system configuration. |
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